Presentation posted on Oct 1, 2020

Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching

from Strategic Materials Conference 2020

A-Carbon films are critical in the 3D NAND process. Thickness and elastic modulus are important to define channel hole and to tune etch profile, respectively. Multiple metrology tools are used to comprehensively characterize this complex system:

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