Optical critical dimension (OCD) metrology and film metrology require accuracy and repeatability. Onto Innovation's techniques are well-established and trusted by semiconductor manufacturers around the globe.
Comprehensive OCD solutions for inline metrology, offline computing and fleet management
Advanced film analysis system
Integrated thin film and OCD metrology solution
Advanced standalone thin film & OCD metrology
Advanced OCD metrology system for 3D NAND and high aspect ratio structures
Overlay and CD metrology for the semiconductor, compound semiconductor, power devices, RF, MEMS, and LED markets
Metrology system for thin film and common OCD measurement
Opto-acoustic film metrology for in-line metal film thickness measurements and material characterization.