Metrology

Optical critical dimension (OCD) metrology and film metrology require accuracy and repeatability. Onto Innovation's techniques are well-established and trusted by semiconductor manufacturers around the globe.

Onto Innovation Metrology Products

OCD Solutions

Comprehensive OCD solutions for inline metrology, offline computing and fleet management

NanoSpec II System

Advanced film analysis system

NanoSpec II System

IMPULSE Series

Integrated thin film and OCD metrology solution

IMPULSE Series

Atlas Series

Advanced standalone thin film & OCD metrology

Atlas Series

Aspect System

Advanced OCD metrology system for 3D NAND and high aspect ratio structures

Aspect System

IVS Series

Overlay and CD metrology for the semiconductor, compound semiconductor, power devices, RF, MEMS, and LED markets

IVS Series

Iris Series

Metrology system for thin film and common OCD measurement

Iris Series

Echo System

Opto-acoustic film metrology for in-line metal film thickness measurements and material characterization.

Echo System

Selected Papers and Articles

Metrology Solutions for Gate-All-Around Transistors in High Volume Manufacturing

Article for Semiconductor Digest

Packaging High-performance Memory Devices

Article for Chip Scale Review

Monitoring Critical Process Steps in 3D NAND and Advanced RF using Picosecond Ultrasonic Metrology

White Paper for China Semiconductor Technology International Conference (CSTIC) 2018

Picosecond Ultrasonics: Characterization of Single Crystal Piezoelectric Materials for Advanced RF Filters

White Paper for Advanced Semiconductor Manufacturing Conference (ASMC) 2018

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