Optical critical dimension (OCD) metrology and film metrology require accuracy and repeatability. Rudolph's techniques are well-established and trusted by semiconductor manufacturers around the globe.
Acoustic film metrology system that provides accurate, in-line thickness measurements of semi-transparent and metal films on product wafers
Transparent film metrology for 100mm, 200mm and 300mm wafers
Advanced film and OCD metrology system
Integrated OCD metrology solution for CMP process control
Comprehensive OCD solutions for inline metrology, offline computing and fleet management
Advanced film analysis system