Improve monitoring capabilities with defect and PL metrology
Defect and PL metrology monitoring are important steps for epi wafers in power and LED device manufacturing. Device makers are looking to improve monitoring capabilities by minimizing inspection steps and combining technologies. With its unique optical design technology, the Imperia detects and classifies yield-killing defects with the additional benefit of simultaneous state-of-the-art photoluminescence (PL) production monitoring. There are significant economic savings to be gained by more accurately predicting MOCVD reactor yield and PM schedules. Combining these two post-epitaxial metrology screening functions into a single high throughput system minimizes valuable fab space use and cassette handling time.
