Article posted on Jul 11, 2016

Packaging and Displays Drive New Litho Requirements

from Solid State Technology

Fan-out wafer level packaging (FOWLP) is gaining traction, leading to higher I/Os and larger formats, and new mobile displays are pushing the limits of pixel per inch (PPI) while also moving to larger formats. Both trends are driving new requirements for lithography equipment, including steppers, track systems and photoresists. Both packages and displays are employing new types of materials and thinner substrates as well. “There’s a lot of commonality between the advanced display technologies and packaging technologies,” said Rich Rogoff, vice president and general manager of Rudolph’s Lithography Systems Group. “The step-and-repeat system approach is ideally suited to address those challenges.”

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