Onto Innovation’s OCD technology offers powerful modeling and computing packages to support various phases of film and OCD measurement setup, data management, and fleet management. These capabilities include model building, runtime data analysis, system calibration, data analytics, data connectivity and management, spectrum management and fleet matching.

Onto OCD solutions consist of several modeling and computing components, including Ai Diffract^™ modeling software, runtime onboard computer, offline modeler, offline model building clusters, and recipe & data management server. Each component seamlessly extends OCD capabilities to Onto’s standalone and integrated metrology systems, providing end-to-end capabilities from offline recipe support and development to fab-wide networking and connectivity for easy fleet management.

Learn more about each component below.

The PrimaScan system utilizes laser scatterometry and imaging techniques leveraging proprietary optics and sensing technologies for reliable inspection of nanometer sized defects on a variety of opaque and transparent/semi-transparent substrates suitable for either R&D or high-volume manufacturing environments. With multiple detection channels, the system can detect, measure, characterize and image surface particles, scratches, pits, bumps, surface contamination, film or bulk wafer stress, voids/inclusions, including chips and cracks at the wafer edge.

The PrimaScan system addresses challenges in both incoming wafer quality control and in inline process monitoring. Capable of handling multiple substrate materials, it uniquely addresses inline process defect and contamination monitoring in wafer-based production environments.

Designed with versatility in mind the PrimaScan system can handle a variety of wafer sizes and substrate types

In a fast-changing industry, AutoShell software ensures competitiveness by seamlessly connecting systems, equipment and people in the factory. Its reliability and uptime make it essential for digital transformation.

AutoShell software unifies products, processes, equipment, stakeholders and facilities through versatile communication protocols across factory networks, optimizing limited IT resources. Its gateway, data acquisition tools, automation suite and multilingual development kit enable efficient data management and communication.

With over 10,000 systems across 500+ product types, AutoShell software empowers customers to execute factory operations without interruption, driving productivity and adaptability. It isn’t just software—it’s the backbone of the future-ready factory.

Next-generation technology nodes are advancing faster than process equipment development, challenging manufacturers to shorten product timelines. The ControlWORKS platform streamlines tool automation, allowing engineers to focus on innovation that drives market adoption. Its Object-Oriented Architecture supports swift development of diverse equipment types and processes. The Reusable Class Library enhances exception handling, communication and multitasking. Its SEMI® software compliant design adheres to industry standards (SECS/GEM, EDA, 300mm) and functions across multiple operating systems, including Windows, Linux and VxWorks. Together, these features empower efficient and scalable manufacturing, while ensuring compatibility with industry norms.

Discover Defect software readily integrates into any wafer or panel production environment. It flexibly brings together all pertinent fab information, including defect, sort, metrology, wip, and electrical, into a single big data-capable solution. Its speed and up-time are world class.

Discover Defect software will pay for itself repeatedly by enabling its users to identify and solve problems, as well as to monitor and alarm on known areas of concern quickly and accurately. The product is designed to improve both throughput and yield while simultaneously reducing manufacturing costs.

Expand your yield analysis capabilities with the power of the Discover Yield software module. Discover Yield software’s patented data mining capabilities and advanced statistical analysis allow for highly sophisticated, interactive root cause analysis. Discover Yield software gives you the power to deep-dive into your data to uncover even the most difficult-to-identify systemic process issues.

Discover Patterns software combines sort and defect spatial patterns utilizing proprietary machine learning (ML) algorithms, to uncover hidden patterns that would have been otherwise lost. Segmentation allows users to eliminate noise and extract definitive patterns from a larger pattern or a seemingly random array of defects. Wafer stacking enables the handling of faint defect trends to more clearly isolate patterns.

Combining Discover Patterns software with the Discover Defect platform multiplies the value of your defect management infrastructure by intelligently identifying and acting upon known patterns in real time. It marks defects and die affected by patterns for deeper understanding of processes and reduces the need for human intervention.

Highlight all patterns, not just the dominant ones