JetStep® X500 System

The JetStep X500 system is designed to provide AICS and OSAT manufacturers with a high-volume manufacturing lithography solution for heterogeneous integration. The JetStep X500 system exposes panel-type substrates made of CCL, FR4, composite, glass or other materials.

JetStep® X500 System

Product Overview

The JetStep X500 panel lithography system is optimized for high volume manufacturing of high-end AICS and other advanced packaging panel applications. As we approach the limits of Moore’s law, the JetStep X500 system addresses the need for extremely large packages integrating multi-node chips, or “chiplets,” enhancing functionality, speed, I/O count and reducing power consumption for server farms, AI, and mobile applications. The JetStep X500 system features the industry’s largest exposure field , fine line RDL resolution with large depth of focus (DOF), excellent overlay accuracy, and automatic magnification compensation with independent x and y magnification adjustment. The JetStep X500 system handles a large range of substrate thicknesses with high levels of warp, offering unique imaging parameter control to compensate for panel distortion. Additionally, it can run highly warped substrates with an edge clamping option and provides real-time autofocus at every exposure site to compensate for challenging topography.

Applications

  • AICS
  • Fan-out panel level packaging (FOPLP)
  • Large package formats, exposed without stitching
  • Large interposers
  • Redistribution layer (RDL) / underbump metallization (UBM)
  • Vias in photo imageable dielectric (PID)

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Do you have a JetStep X500 question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

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JetStep® S3500 System

The JetStep S3500 system is designed to provide OSATS with a high-volume manufacturing advanced packaging lithography solution. For substrates up to 720mm x 600mm, it supports fan-out panel level packaging.

JetStep® S3500 System

Product Overview

The JetStep S3500 panel lithography system is specifically designed for advanced packaging panel production. As fan-out packages increase in size and complexity, requiring panel substrates instead of wafers, the JetStep S3500 system addresses these challenges with advanced features. It handles die shift caused by placement accuracy errors, CTE mismatch and panel warpage. The system incorporates a large exposure field (59.4 x 59.4mm) with resolution capability to 2/2 L/S and options for increased resolution to 1/1. In addition, it supports multiple exposure wavelengths, ideal for process development with new photosensitive polymers. Application-specific options include warped panel handling, “on-the-fly” optical focus, and die shift correction (StepFAST Solution), helping to ensure precise and reliable panel-level packaging.

Applications

  • Fan-out panel level packaging (FOPLP)
  • Interposers
  • Photo imageable Dielectric (PID) vias
  • Redistribution lines (RDL) / Under bump metallization (UBM)
  • Non-standard substrates

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Do you have a JetStep S3500 question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

Let’s Talk

"*" indicates required fields

This field is for validation purposes and should be left unchanged.