F30™ System

The F30 system is designed to blur the lines between dark field micro inspection and traditional macro inspection, providing automated defect inspection for front-end and outgoing quality (OQA) applications.

F30™ System

Product Overview

The F30 automated defect inspection system combines high resolution and throughput to drive fab yield and productivity. A five-objective turret enables resolution-throughput flexibility, while its multi-channel illumination including brightfield, darkfield, high-angle ring light, and IR-Review addresses the requirements for today’s multi-process inspection applications. Equipped with an advanced productivity suite (waferless recipe creation, simultaneous FOUP, recipe server and tool matching), the F30 System redefines inspection cost of ownership expectations. The system can handle 100mm – 300mm wafers can be paired with the edge and backside module (EB40) to provide an all-surface inspection solution.

Applications

  • After develop inspection (ADI)
  • Post CMP inspection
  • After etch inspection
  • Fab Outgoing QA
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Discover® Defect Software

Integrated defect management system that works seamlessly with Onto tools and your entire enterprise, bringing data together for greater visibility and cleaner operation.
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TrueADC® Software

Automated defect classification software with deep learning, real defect modeling and seamless integration with Onto AOI tools.
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Celero™ PL System

The Celero PL system is designed for subsurface defect inspection and classification for silicon carbide (SiC) and gallium nitride (GaN) based wafers and compound semiconductor materials.

Celero™ PL System

Product Overview

The Celero PL system utilizes a laser-based phase detection and imaging capability that leverages custom optics and image processing algorithms to enable best in class throughput and sensitivity for silicon carbide and gallium nitride-based materials on 100mm to 300mm wafer sizes. Leveraging multiple light sources and sensor channels, the system can detect, measure and image a broad variety of subsurface crystalline defects, associated with bulk wafers and epitaxial layers, surface particles, scratches, pits, surface contamination, stains, point or bulk wafer stress, voids/inclusions, including chips and cracks at the edge of the wafer.

Applications

  • Frontside / backside / edge / subsurface defectivity and contamination
  • Crystalline defectivity in III-V substrates and epitaxial layers
  • Thick wafer / seed wafer surface and sub-surface defectivity
  • Substrate-to-epitaxial layer defect mapping (sub-defect mapping)
  • Wafer based microLED / VCSEL / EE laser materials
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PrimaScan™ System

All-surface defect and contamination inspection for unpatterned wafer and blanket films, with imaging capability for opaque, transparent and semi-transparent wafers, reticles and piece parts.
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PrimaScan™ R&D System

All-surface defect and contamination inspection for unpatterned wafer and blanket films, with imaging capability for opaque, transparent and semi-transparent wafers, reticles and piece parts.
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PrimaScan™ R&D System

The PrimaScan R&D System is a stand-alone, manual load version of the PrimaScan automated wafer defect and contamination inspection system that has been specifically designed with R&D and lab environments in mind.

PrimaScan™ R&D System

Product Overview

The PrimaScan R&D system offers a smaller spot size and higher pixel resolution than its high volume production counterpart tools. The flexibility in sample handling options combined with the multiple sensing channels and higher resolution imaging makes this the ideal tool for R&D and lab environments. Similar to the other tools in the PrimaScan line, the PrimaScan R&D system offers reliable inspection of nanometer sized defects on a variety of opaque and transparent/semi-transparent substrates and samples suitable for either R&D or lab environments. The system can detect, measure, characterize and image surface particles, scratches, pits, bumps, surface contamination, film or bulk wafer stress, voids/inclusions, including chips and cracks at the wafer edge.

Designed with versatility in mind the PrimaScan R&D system can handle a variety of wafer sizes and substrate types including film frame, photomask and sample tray.

Applications

  • Opaque or transparent wafer incoming quality (ICQ) inspection
  • Process monitor wafer particle and contamination inspection
  • Unpatterned blanket photoresist, dielectric or metallic coated wafer defect inspection
  • Subsurface defectivity inspection for transparent and semi-transparent films and substrates
  • Glass wafer defect and contamination inspection for microfluidics, microlens arrays for AR/VR/MR, flat optics, etc.
  • Post-CMP or post-grind defect inspection
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PrimaScan™ System

All-surface defect and contamination inspection for unpatterned wafer and blanket films, with imaging capability for opaque, transparent and semi-transparent wafers, reticles and piece parts.
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PrimaScan™ P System

All-surface defect and contamination inspection for unpatterned glass panel substrates with imaging capability for panels up to 600x600mm in size.
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EB40™ Module

The EB40 Module combines edge and backside inspection into one tool with the option to be paired with an inspection system to provide a high throughput all surface inspection solution.

EB40™ Module

Product Overview

The Class 1 certified EB40 module offers combined edge and backside inspection and is also available as separate edge (E40) and backside (B40) modules. These modules provide brightfield and darkfield inspection to detect defects on the entire bevel and backside, covering Zone 1 to Zone 5. This enables faster root-cause analysis of defects that can migrate to the wafer interior, impacting die yield.

The EB40 module captures defect images on the fly, creates whole-wafer composite images, and integrates with SEM bevel review. All inspection and metrology results, including defect, whole wafer and SEM images can be analyzed together in a single database using Discover Defect software. Correlating EBR metrology with defectivity data, SEM data and micro-inspection results is just the beginning of what Discover software can do. In addition to advanced on-tool defect binning, real-time edge ADC classification can be assigned to defects prior to manual offline review using Discover Review software.

Applications

  • EDGE INSPECTION
  • Lithography process monitoring
  • Cracks/Chips, Slurry, cleaning contaminants and residual films
  • EBR Metrology
  • Bonded wafer adhesive inspection
  • BACKSIDE INSEPCTION
  • Scratches
  • Chuck and end effector signatures
  • Backside particles and residues
  • Wafer level pattern detection
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Dragonfly® G3 System

Automated high speed sub-micron 2D inspection and 3D inspection/metrology for inline process control of pattern defects in next generation technologies for advanced packaging, specialty and OQA.
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F30™ System

Advanced macro inspection for front-end manufacturers.
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NSX® 330 System

2D automated defect inspection and sample 3D inspection for advanced packaging.
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Discover® Defect Software

Integrated defect management system that works seamlessly with Onto tools and your entire enterprise, bringing data together for greater visibility and cleaner operation.
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Discover® Review Software

Your smart factory’s human classification interface.
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Enabling In-Line Process Control for Hybrid Bonding Applications

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Dragonfly® G3 System

The Dragonfly G3 system is resetting the industry’s expectations for throughput, accuracy and reliability. Combining 2D and 3D technologies, the system detects yield-robbing defects and measures features critical for today’s front-end and packaging technologies.

Dragonfly® G3 System

Product Overview

The Dragonfly G3 system utilizes line scan-based 2D imaging technology to provide fast, reliable inspection for sub-micron defects, meeting both current R&D and future production needs. It features multi-illumination channels, including brightfield/darkfield, high-speed IR for embedded defects and Clearfind® Technology for non-visual residue detection. For specialty markets like CMOS image sensors (CIS), it uses oblique angle illumination, sophisticated image processing and machine-learning algorithms to detect low contrast defects in the active pixel sensor area.

Optional 3D metrology sensors include the latest 3Di technology, delivering fast, precise bump height metrology. Discover Software visualizes the massive amounts of bump data, correlating process variations to improve yields. TrueADC software enables real time automatic classification of critical defects and reduces nuisance defects. The Dragonfly G3 system, with optional edge and backside inspection via the EB40 module, offers a comprehensive all-surface inspection solution for next generation technology challenges.

Applications

  • Redistribution layers (RDL): after develop, after etch
  • Reconstituted and bonded wafers
  • Micro bumps and Cu pillars
  • Post saw
  • Gel and waffle pack inspection
  • Post probe and testing
  • OQA
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Discover® Defect Software

Integrated defect management system that works seamlessly with Onto tools and your entire enterprise, bringing data together for greater visibility and cleaner operation.
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Discover® Review Software

Your smart factory’s human classification interface.
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trueadc_feat

TrueADC® Software

Automated defect classification software with deep learning, real defect modeling and seamless integration with Onto AOI tools.
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Inspection Tool Productivity Software

Software solutions to increase the value of your inspection tool.
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Abstract

A vital component of modern communication systems, bulk acoustic wave resonators (BAW) function as filters, oscillators, and sensors. In a BAW device, the acoustic waves are confined within a specific region to achieve efficient resonance. The air ring structure, including the edge air layer structure, prevents acoustic energy from leaking. However, measuring the critical dimensions (CD) of edge air layers is challenging. In this paper, we will show how Onto Innovation’s IVS™ 220 optical overlay and CD metrology system can measure the edge air layer structure using a CD step application. The IVS 220 system provides good repeatability and high throughput [130 wph, five (5) fields, one (1) site per field]. In addition, the IVS 220 system also can be used for overlay measurement, CD measurement (including angle CD and diameter of the circle or hole), and Z height measurement.

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