Yield Optimizer software is the next incarnation of analytics on the evolutionary scale. The software’s disruptive technology analyzes relationships between multivariant data and their complex interactions. By examining any set of conceivable inputs and outputs, Yield Optimizer software identifies the relationships and interactions that lead to positive operational changes. Easily understood visuals empower even casual users to understand what is important before making adjustments.

Yield Optimizer software evaluates multiple models and suggests the best one for the data. Using machine learning, it examines the interactions between in-process metrology readings and end-of-line test results for any semiconductor product family and recommends changes to the in-process metrology targets. When licensed as a service, it enables users to leverage an on-demand infrastructure to apply easily understood workflows for complex analytics without the overhead.

TrueADC software sets a new standard in defect classification by combining advanced analytics with intuitive usability. Seamlessly integrated with Onto Innovation’s AOI tools and Discover platforms, TrueADC software enhances inspection value through a proprietary hybrid decision-making process across all wafers and surfaces.

With over 70% reduction in manual review, TrueADC software intelligently flags low-confidence defects as “unknown” to avoid misclassification. Its dynamic defect library method uses real defect examples—unlike traditional ADCs that rely on approximations—delivering more accurate and efficient results.

Supporting adder, repeater, SPR codes, and region-of-interest data, it enables precise tool sampling and binning. Operators can quickly classify new defects without altering recipes, while the software’s multi-engine mode leverages deep learning to reduce overkill and underkill.

From model development to identifying hard-to-isolate defects, TrueADC software empowers engineers with greater clarity, control, and confidence.

Discover Defect software readily integrates into any wafer or panel production environment. It flexibly brings together all pertinent fab information, including defect, sort, metrology, wip, and electrical, into a single big data-capable solution. Its speed and up-time are world class.

Discover Defect software will pay for itself repeatedly by enabling its users to identify and solve problems, as well as to monitor and alarm on known areas of concern quickly and accurately. The product is designed to improve both throughput and yield while simultaneously reducing manufacturing costs.

Expand your yield analysis capabilities with the power of the Discover Yield software module. Discover Yield software’s patented data mining capabilities and advanced statistical analysis allow for highly sophisticated, interactive root cause analysis. Discover Yield software gives you the power to deep-dive into your data to uncover even the most difficult-to-identify systemic process issues.

Discover Patterns software combines sort and defect spatial patterns utilizing proprietary machine learning (ML) algorithms, to uncover hidden patterns that would have been otherwise lost. Segmentation allows users to eliminate noise and extract definitive patterns from a larger pattern or a seemingly random array of defects. Wafer stacking enables the handling of faint defect trends to more clearly isolate patterns.

Combining Discover Patterns software with the Discover Defect platform multiplies the value of your defect management infrastructure by intelligently identifying and acting upon known patterns in real time. It marks defects and die affected by patterns for deeper understanding of processes and reduces the need for human intervention.

Highlight all patterns, not just the dominant ones

Discover Review software improves system productivity by enabling its users to review results offline. Users can examine defect results from any inspection tool connected to the Discover server. Multiple client usage enhances productivity by supporting concurrent review with overwrite protection while partial review status enables operator shift changes. Visualize defects individually or collectively using an interactive, all-surface (front, edge, back) wafer map viewer. The gallery review mode allows users to select individual or multiple images by wafer or die for fast classification and defect comparison. Discover Review Software also includes a large number of wafer map exports and customizable reports.

Point-to-point review and advanced image browsing

Discover RMS software is a factory-level recipe management system that provides a central server repository for all recipes. This system allows desktop access for editing and includes complete version control of all recipes used within the fab.

When coupled with Discover Run-to-Run software, it fundamentally tracks all control changes by automatically inserting recipe values into the recipe body. Working in concert with your MES system, recipes are automatically selected and downloaded to the right tool to be executed on the right material. The recipe sign-off feature enforces a tight control of recipes by ensuring customer approval of any large changes.

The Discover RMS Process