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Atlas® V System

The Atlas V system is an OCD and thin film metrology tool for high volume manufacturing, enabling FinFET & Gate-All-Around (GAA) logic, DRAM, and 3D NAND device process control.

Atlas® V System

Product Overview

The Atlas V system combines state of the art optical design with an innovative Ai Diffract modeling engine, providing OCD and thin film metrology solutions for measuring complex 3D device structures. The dual channel optical architecture consists of a DUV 4×4 Mueller Matrix (MM) SE and a DUV polarized normal incident reflectometer (NIOCD). Together, they provide rich information for OCD analysis at high precision and high throughput. The Atlas V system is designed to measure the most critical and challenging process steps that include buried features, not visible by CD-SEM and other techniques.

With unique capabilities, such as measuring individual nanowire dimension in a GAA logic device, the Atlas V system is an enabling technology for leading edge device process control.

Applications

  • OCD for litho, etch, CVD & CMP process in all device segments
  • Local variation
  • Asymmetry and tilt
  • Common and critical films
  • Stress & wafer warpage
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Do you have an Atlas V system question? Let’s talk!

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Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

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