OCD Solutions

A suite of OCD modeling software and computing hardware that enables the full capability and connectivity across all Onto OCD and thin film metrology systems, including Atlas, Aspect, Iris and IMPULSE systems.

OCD Solutions

Product Overview

Onto Innovation’s OCD technology offers powerful modeling and computing packages to support various phases of film and OCD measurement setup, data management, and fleet management. These capabilities include model building, runtime data analysis, system calibration, data analytics, data connectivity and management, spectrum management and fleet matching.

Onto OCD solutions consist of several modeling and computing components, including Ai Diffract modeling software, runtime onboard computer, offline modeler, offline model building clusters, and recipe & data management server. Each component seamlessly extends OCD capabilities to Onto’s standalone and integrated metrology systems, providing end-to-end capabilities from offline recipe support and development to fab-wide networking and connectivity for easy fleet management.

Learn more about each component below.

Ai Diffract™ Software

AI-guided OCD modeling and analysis software for high accuracy in-line optical metrology and offline recipe development

Ai Diffract software is a powerful modeling, visualization and analysis software with an intuitive 3D modeling interface to simplify the building and visualization of today’s most complex semiconductor devices. It offers OCD modeling and advanced machine learning capabilities, next-generation real-time regression, offline sensitivity analysis tools and comprehensive GUI and structure input for true multi-variant modeling. Ai Diffract software’s proprietary fitting algorithms enable fast and accurate calculations for signal processing, helping ensure high fidelity model-based measurements. Automation features for spectral fitting, recipe optimization, and sensitivity analysis offer great user productivity. The first-in-market AI-guided engine synergizes physics-based modeling and machine learning to deliver the most robust solution with quick time to solution.

Ai Diffract Modeler is the offline analytical engine that allows users to create and edit recipes offline. It supports multiple users and can connect to Ai Diffract cluster for high intensity computing.

Ai Diffract Onboard is the on-tool runtime engine that maximizes tool throughput for complex use cases. It ensures rapid analysis without interfering with system operation or impacting throughput.

Ai Diffract Cluster is an enterprise scale computing server deployed for offline recipe development or in-line real-time regression. Optimized to support the workload of Ai Diffract software analysis, it scales based on fleet size, recipe numbers, and computing intensity.

Recipe Distribution Server (RDS) / Nexus Servers is a fab-wide networking and server system for fleet management and connectivity. RDS/Nexus servers provide connectivity and support to Ai Diffract recipe management and distribution, data/spectrum feed-forward and feedback, spectrum management, and fleet management.

Related Products
View all
atlasv_feat

Atlas® V System

High performance OCD and thin film metrology for advanced GAA and memory devices.
View Product
atlasiii_feat

Atlas® III+ System

Versatile OCD and thin film metrology for mature and mainstream nodes.
View Product
iris_feat

Iris™ S System

All-in-one solution for film metrology, OCD and stress measurements, tailored for advanced packaging and specialty segments.
View Product
impulse v_feat

IMPULSE® V System

Advanced high throughput integrated metrology system with AI-driven machine learning option. The system offers maximum sensitivity and accuracy to CMP process excursions and enables process engineers to establish APC control with high-accuracy feedback.
View Product
impulse+_feat

IMPULSE®+ System

Integrated metrology system offering maximum sensitivity and accuracy to CMP process excursions and enabling process engineers to establish APC control with high-accuracy feedback.
View Product
aspect_feat

Aspect® System

Advanced infrared optical critical dimension (IRCD) metrology system for high aspect ratio structures in 3D NAND, 2D & 3D DRAM, CIS and power devices.
View Product
Related Insights & Resources
View all
impulse-1-duo

Enhancing CMP Process Control with Intelligent Line Monitoring & Integrated Metrology

Learn more
Screenshot-2025-03-11-110309

Optical Critical Dimension Metrology with Spectroscopic Ellipsometry

Learn more
GAA

Optical Critical Dimension Metrology for Semiconductor Manufacturing

Learn more
fig-1_200720_065724

Metrology Solutions for Gate-All-Around Transistors in High Volume Manufacturing

Learn more
abstract-dots-scaled

Artificial Intelligence and Machine Learning in Semiconductor Manufacturing: Inspection and Metrology

Learn more

Do you have an OCD solutions question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

Let’s Talk

"*" indicates required fields

This field is for validation purposes and should be left unchanged.

PrimaScan™ System

The PrimaScan wafer defect inspection system delivers a flexible, high sensitivity solution at the lowest cost of ownership per pass.

PrimaScan System

Product Overview

The PrimaScan system utilizes laser scatterometry and imaging techniques leveraging proprietary optics and sensing technologies for reliable inspection of nanometer sized defects on a variety of opaque and transparent/semi-transparent substrates suitable for either R&D or high-volume manufacturing environments. With multiple detection channels, the system can detect, measure, characterize and image surface particles, scratches, pits, bumps, surface contamination, film or bulk wafer stress, voids/inclusions, including chips and cracks at the wafer edge.

The PrimaScan system addresses challenges in both incoming wafer quality control and in inline process monitoring. Capable of handling multiple substrate materials, it uniquely addresses inline process defect and contamination monitoring in wafer-based production environments.

Designed with versatility in mind the PrimaScan system can handle a variety of wafer sizes and substrate types

Applications

  • Opaque or transparent wafer incoming quality (ICQ) inspection
  • Process monitor wafer particle and contamination inspection
  • Unpatterned blanket photoresist, dielectric or metallic coated wafer defect inspection
  • Subsurface defectivity inspection for transparent and semi-transparent films and substrates
  • Glass carrier wafer defect and contamination inspection for advanced packaging
  • Glass wafer defect and contamination inspection for microfluidics, microlens arrays for AR/VR/MR, flat optics, etc.
Related Products
View all
primascanp_feat

PrimaScan™ P System

All-surface defect and contamination inspection for unpatterned glass panel substrates with imaging capability for panels up to 600x600mm in size.
View Product
primascan r&d_feat

PrimaScan™ R&D System

All-surface defect and contamination inspection for unpatterned wafer and blanket films, with imaging capability for opaque, transparent and semi-transparent wafers, reticles and piece parts.
View Product
Related Resources
View all
clear advantage

A Clear Advantage: Precision Glass Carrier Inspection for AI and HPC Markets

Learn more

Do you have a PrimaScan system question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

Let’s Talk

"*" indicates required fields

This field is for validation purposes and should be left unchanged.

Yield Optimizer™ Software

Yield Optimizer software is part of a comprehensive next-level data management portfolio. It reimagines manufacturing line control and analytics to explore the impact of previously invisible factors in day-to-day factory operation.

Product Overview

Yield Optimizer software is the next incarnation of analytics on the evolutionary scale. The software’s disruptive technology analyzes relationships between multivariant data and their complex interactions. By examining any set of conceivable inputs and outputs, Yield Optimizer software identifies the relationships and interactions that lead to positive operational changes. Easily understood visuals empower even casual users to understand what is important before making adjustments.

Yield Optimizer software evaluates multiple models and suggests the best one for the data. Using machine learning, it examines the interactions between in-process metrology readings and end-of-line test results for any semiconductor product family and recommends changes to the in-process metrology targets. When licensed as a service, it enables users to leverage an on-demand infrastructure to apply easily understood workflows for complex analytics without the overhead.

Applications

  • Yield Prediction
  • Process Targeting
  • Design of Experiment (DOE) Assistant
  • Troubleshooting

 

Neural networks model today’s data to achieve tomorrow’s in-line targets

 

Users across the fab benefit from Yield Optimizer software’s easy-to-apply analytics

Related Products
View all
discoverdefect_feat

Discover® Defect Software

Integrated defect management system that works seamlessly with Onto tools and your entire enterprise, bringing data together for greater visibility and cleaner operation.
View Product
discoveryield_feat

Discover® Yield Software

An advanced yield analysis toolkit that seamlessly integrates data from your entire enterprise, helping to prevent loss and better understand your process needs.
View Product
Related Insights & Resources
View all
Default product image

Getting The Biggest ROI On Your Digital Twin

Learn more
Importance-of-Secure-Data-may-2024

The Importance of Secure Data Sharing

Learn more
add-yield

Addressing Yield Challenges in Advanced IC Substrate (AICS) Packaging

Learn more
using-machine-learning

Using Machine Learning to Increase Yield and Lower Packaging Costs

Learn more
Default product image

Metrology Sampling Plans Are Key For Device Analytics And Traceability

Learn more
Sky-High-Image

Sky High: More Thoughts To Consider Before Transitioning To The Cloud

Learn more
Default product image

Up and Away!: Clear-eyed considerations for your cloud-adoption journey

Learn more
Default product image

Nip the Defect in the Bud: Using an external inspection system and FDC software increases ABF substrate yield

Learn more
RF-smart-car-scaled

Strategies For Meeting Stringent Standards For Automotive ICs

Learn more
Onto_building-MCM-factory-yield-analytics-fig1

What Does It Take To Build A Successful Multi-Chip Module Factory?

Learn more
Fab-white-paper-image

Fab Fingerprint for Proactive Yield Management

Learn more
Lightbulb-with-connecting-dots-scaled

The Big Squeeze – Why OSATs Need to Work Smarter

Learn more

Do you have a Yield Optimizer software question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

Let’s Talk

"*" indicates required fields

This field is for validation purposes and should be left unchanged.

TrueADC® Software

TrueADC software enhances defect classification accuracy and efficiency by combining deep learning, real-world defect modeling, and intuitive workflows—reducing manual review and improving decision-making across all wafers and surfaces.

Product Overview

TrueADC software sets a new standard in defect classification by combining advanced analytics with intuitive usability. Seamlessly integrated with Onto Innovation’s AOI tools and Discover platforms, TrueADC software enhances inspection value through a proprietary hybrid decision-making process across all wafers and surfaces.

With over 70% reduction in manual review, TrueADC software intelligently flags low-confidence defects as “unknown” to avoid misclassification. Its dynamic defect library method uses real defect examples—unlike traditional ADCs that rely on approximations—delivering more accurate and efficient results.

Supporting adder, repeater, SPR codes, and region-of-interest data, it enables precise tool sampling and binning. Operators can quickly classify new defects without altering recipes, while the software’s multi-engine mode leverages deep learning to reduce overkill and underkill.

From model development to identifying hard-to-isolate defects, TrueADC software empowers engineers with greater clarity, control, and confidence.

Applications

  • On-tool with Onto AOI systems
  • Inline defect classification
  • Dynamic defect library utilization
  • Support for advanced defect types
Related Products
View all
discoverdefect_feat

Discover® Defect Software

Integrated defect management system that works seamlessly with Onto tools and your entire enterprise, bringing data together for greater visibility and cleaner operation.
View Product
discoverreview_feat

Discover® Review Software

Your smart factory’s human classification interface.
View Product
Related Insights & Resources
View all
june-2024-blog

Achieving Zero Defect Manufacturing Part 1: Detect & Classify

Learn more
Escape-rate-defects-april-2024

Using Automatic Defect Classification to Reduce the Escape Rate of Defects

Learn more
ADC-for-deep-learning

Using Deep Learning ADC for Defect Classification for Automatic Defect Inspection

Learn more
mystery

A Bare Wafer Mystery: Inspecting for Back, Edge and Notch Defects in Advanced Nodes

Learn more
add-yield

Addressing Yield Challenges in Advanced IC Substrate (AICS) Packaging

Learn more

Do you have a TrueADC software question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

Let’s Talk

"*" indicates required fields

This field is for validation purposes and should be left unchanged.

AutoShell® Software

AutoShell software accelerates Industry 4.0 adoption by connecting multiple data sources throughout the fab in a single platform.

Product Overview

In a fast-changing industry, AutoShell software ensures competitiveness by seamlessly connecting systems, equipment and people in the factory. Its reliability and uptime make it essential for digital transformation.

AutoShell software unifies products, processes, equipment, stakeholders and facilities through versatile communication protocols across factory networks, optimizing limited IT resources. Its gateway, data acquisition tools, automation suite and multilingual development kit enable efficient data management and communication.

With over 10,000 systems across 500+ product types, AutoShell software empowers customers to execute factory operations without interruption, driving productivity and adaptability. It isn’t just software—it’s the backbone of the future-ready factory.

Related Products
View all
discoverruntorun_feat

Discover® Run-to-Run Software

Automating process control with precision and efficiency
View Product
discoverfdc_feat

Discover® FDC Software

Your tool’s stepping stone to maximize efficiency, minimize downtime and ensure quality results.
View Product

Do you have an AutoShell software question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

Let’s Talk

"*" indicates required fields

This field is for validation purposes and should be left unchanged.

ControlWORKS® Software

ControlWORKS software manages equipment-level material handling, factory communication, advanced scheduling and UI development through a comprehensive single machine control platform. This software increases product development efficiency and reduces time to market.

Product Overview

Next-generation technology nodes are advancing faster than process equipment development, challenging manufacturers to shorten product timelines. The ControlWORKS platform streamlines tool automation, allowing engineers to focus on innovation that drives market adoption. Its Object-Oriented Architecture supports swift development of diverse equipment types and processes. The Reusable Class Library enhances exception handling, communication and multitasking. Its SEMI® software compliant design adheres to industry standards (SECS/GEM, EDA, 300mm) and functions across multiple operating systems, including Windows, Linux and VxWorks. Together, these features empower efficient and scalable manufacturing, while ensuring compatibility with industry norms.

ControlWORKS® Software

Applications

  • Logic and Foundry
  • SiC and GaN based power devices
  • RF Devices
  • 3D NAND
  • DRAM
  • MEMS

Do you have a ControlWORKS software question? Let’s talk!

As your partner for innovative solutions, we’re always here for you.

Discover how our cutting-edge semiconductor solutions are engineered to meet your most complex challenges: delivering performance, reliability and innovation where it matters most.

Let’s Talk

"*" indicates required fields

This field is for validation purposes and should be left unchanged.