TrueADC software sets a new standard in defect classification by combining advanced analytics with intuitive usability. Seamlessly integrated with Onto Innovation’s AOI tools and Discover platforms, TrueADC software enhances inspection value through a proprietary hybrid decision-making process across all wafers and surfaces.

With over 70% reduction in manual review, TrueADC software intelligently flags low-confidence defects as “unknown” to avoid misclassification. Its dynamic defect library method uses real defect examples—unlike traditional ADCs that rely on approximations—delivering more accurate and efficient results.

Supporting adder, repeater, SPR codes, and region-of-interest data, it enables precise tool sampling and binning. Operators can quickly classify new defects without altering recipes, while the software’s multi-engine mode leverages deep learning to reduce overkill and underkill.

From model development to identifying hard-to-isolate defects, TrueADC software empowers engineers with greater clarity, control, and confidence.

In a fast-changing industry, AutoShell software ensures competitiveness by seamlessly connecting systems, equipment and people in the factory. Its reliability and uptime make it essential for digital transformation.

AutoShell software unifies products, processes, equipment, stakeholders and facilities through versatile communication protocols across factory networks, optimizing limited IT resources. Its gateway, data acquisition tools, automation suite and multilingual development kit enable efficient data management and communication.

With over 10,000 systems across 500+ product types, AutoShell software empowers customers to execute factory operations without interruption, driving productivity and adaptability. It isn’t just software—it’s the backbone of the future-ready factory.

Next-generation technology nodes are advancing faster than process equipment development, challenging manufacturers to shorten product timelines. The ControlWORKS platform streamlines tool automation, allowing engineers to focus on innovation that drives market adoption. Its Object-Oriented Architecture supports swift development of diverse equipment types and processes. The Reusable Class Library enhances exception handling, communication and multitasking. Its SEMI® software compliant design adheres to industry standards (SECS/GEM, EDA, 300mm) and functions across multiple operating systems, including Windows, Linux and VxWorks. Together, these features empower efficient and scalable manufacturing, while ensuring compatibility with industry norms.

Discover Defect software readily integrates into any wafer or panel production environment. It flexibly brings together all pertinent fab information, including defect, sort, metrology, wip, and electrical, into a single big data-capable solution. Its speed and up-time are world class.

Discover Defect software will pay for itself repeatedly by enabling its users to identify and solve problems, as well as to monitor and alarm on known areas of concern quickly and accurately. The product is designed to improve both throughput and yield while simultaneously reducing manufacturing costs.

Expand your yield analysis capabilities with the power of the Discover Yield software module. Discover Yield software’s patented data mining capabilities and advanced statistical analysis allow for highly sophisticated, interactive root cause analysis. Discover Yield software gives you the power to deep-dive into your data to uncover even the most difficult-to-identify systemic process issues.

Discover Patterns software combines sort and defect spatial patterns utilizing proprietary machine learning (ML) algorithms, to uncover hidden patterns that would have been otherwise lost. Segmentation allows users to eliminate noise and extract definitive patterns from a larger pattern or a seemingly random array of defects. Wafer stacking enables the handling of faint defect trends to more clearly isolate patterns.

Combining Discover Patterns software with the Discover Defect platform multiplies the value of your defect management infrastructure by intelligently identifying and acting upon known patterns in real time. It marks defects and die affected by patterns for deeper understanding of processes and reduces the need for human intervention.

Highlight all patterns, not just the dominant ones

Discover Review software improves system productivity by enabling its users to review results offline. Users can examine defect results from any inspection tool connected to the Discover server. Multiple client usage enhances productivity by supporting concurrent review with overwrite protection while partial review status enables operator shift changes. Visualize defects individually or collectively using an interactive, all-surface (front, edge, back) wafer map viewer. The gallery review mode allows users to select individual or multiple images by wafer or die for fast classification and defect comparison. Discover Review Software also includes a large number of wafer map exports and customizable reports.

Point-to-point review and advanced image browsing