Abstract
The Schwarz inequality for ellipsometry/polarimetry using a single rotating compensator either before or after a reflecting sample can be used to obtain constraints on the Fourier coefficients of the light intensity passing through the system. These constraints are equivalent and suggest a similar set of constraints for a dual rotating compensator Mueller matrix ellipsometer or polarimeter. These constraints are used to analyze various artifacts in the Mueller matrix system and compare those with results for the single rotating compensator systems. The analysis also leads to a fundamental advantage of the Mueller matrix system.
Event Details
| Date | Nov 21, 2025 |
|---|---|
| Time | 2:45 pm - 3:15 pm |
| Location | Milpitas, CA |
| Event | IEEE Symposium on Reliability for Electronics and Photonics Packaging |
| Presenters |
Jon Opsal
Jon Opsal, PhD, is currently Chief Metrologist for Operations at Onto Innovation since September 2016 after having retired from Therma-Wave in June 2007 as senior vice president and chief technical officer of Therma-Wave since February 2001. Prior to that he served as vice president of research and development since June 1994 and various technical positions within the company prior to that. Before joining Therma-Wave in September 1982, he was a physicist at the Lawrence Livermore National Laboratory from 1978 to 1982, Research Associate and Assistant Professor at Michigan State University from 1974 to 1978 and Assistant Professor at Portland State University from 1973 to 1974. Dr. Opsal has over 40 years of experience in the semiconductor industry and has authored more than 100 publications. In addition, he holds 127 US patents. He received a BA in physics and mathematics from Eastern Washington University and MS and PhD degrees in physics from Michigan State University.