Imperia® System

With its unique optical design technology, the Imperia system detects and classifies yield-killing defects with the additional benefit of simultaneous state-of-the-art photoluminescence (PL) production monitoring. 

Product Overview

With unique optical design technology, the Imperia system detects and classifies yield-killing defects with the additional benefit of simultaneous state-of-the-art photoluminescence (PL) production monitoring. Combining these two post-epitaxial metrology screening functions into a single high throughput system minimizes valuable fab space use and cassette handling time. This product can provide significant economic savings to the user (for example: accurately predicting MOCVD reactor yield and PM schedules). 

  • High density spectral PL mapping
  • Defect analysis and classification
  • Epitaxial layer thickness and normalized reflectivity imaging at high resolution
  • Wafer shape profiling and 3D bow reconstruction

Imperia System
Imperia System

High density spectral PL mapping: peak lambda, peak intensity, FWHM and other photonics relevant parameters on bare and patterned wafers
High density spectral PL mapping: peak lambda, peak intensity, FWHM and other photonics relevant parameters on bare and patterned wafers

Defect analysis and classification software capabilities
Defect analysis and classification software capabilities

Wafer shape profiling and 3D bow reconstruction at multiple angles and high resolution
Wafer shape profiling and 3D bow reconstruction at multiple angles and high resolution

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